X-Ray Study of Dynamics of Growing Wetting Films
| dc.contributor.advisor | Press, Werner (Professor) | |
| dc.contributor.author | Woldeghebriel, Hagos | |
| dc.date.accessioned | 2018-06-27T05:40:29Z | |
| dc.date.accessioned | 2023-11-09T11:23:42Z | |
| dc.date.available | 2018-06-27T05:40:29Z | |
| dc.date.available | 2023-11-09T11:23:42Z | |
| dc.date.issued | 1996-06 | |
| dc.description.abstract | The dynamics of growing wetting films is studied by the method of x-ray scattering in the region of total external reflection. \\"ith a short pulse disturbance caused by a temperature difference between the substrate and the \"apour in the x-ray cell. the wetting film thickness is reduced. Afterwards the time dependence of the -growing film is monitored by x-ray reflectivity measurements. The examined sample systems are H2/Si. CH.3/Si . Ge/Si and a quartz glass wetted by a liquid film of CCk The obsen'ed growth kinetics of the wetting layers are discussed in the framework of a model which is adapted to the experimental conditioll5. particularly the finite temperature stability of the experimental set-up. From the growth law l(t) rx I ~ exp:~(t/T)nl fitted to the data. the time constants T and the dynamic exponent 11 are determined. The quallt ity n depends on the dimension of the growth mechanism | en_US |
| dc.identifier.uri | http://10.90.10.223:4000/handle/123456789/3800 | |
| dc.language.iso | en | en_US |
| dc.publisher | Addis Ababa University | en_US |
| dc.subject | X-Ray Study of Dynamics | en_US |
| dc.title | X-Ray Study of Dynamics of Growing Wetting Films | en_US |
| dc.type | Thesis | en_US |